Effect of Deposition Parameters on Morphological and Compositional Characteristics of Electrodeposited CuFeO2 Film

Deposition parameters determine the characteristics of semiconductor films in electrodeposition. Thus, it is essential to understand effect deposition on electrodeposited film for fabricating suitable fitting various applications. In this work, morphological and compositional properties delafossite CuFeO2 film, according parameters, were studied. The was fabricated by galvanostatic electrodeposition post-annealing process under inert gas flow. type solvent, electrolyte condition, applied current density time controlled as variable parameters. As a result, typical without any impurities, electrolyte-based DMSO solvent. Interestingly, concentration potassium perchlorate complexing agent caused change well transition. On other hand, only influenced morphology film. These observations would provide specific guidelines fabrication with composition